SPIE Advanced Lithography 2017
Veranstaltung
- Titel:
- SPIE Advanced Lithography 2017
- Wann:
- So, 26. Februar 2017 - Mi, 1. März 2017
- Wo:
- San Jose - San Jose, California
- Kategorie:
- Info extern
Beschreibung
SPIE Advanced Lithography 2017
Featured technologies at the exhibition
• Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
• Metrology, inspection, OPC, and process control
• Design and manufacturing software
• Materials and chemicals
• Imaging equipment
• Lasers
• Resist materials and processing
• Nano-imprint
• IC and chip fabrication
• Nanoscale imaging
• Etch Technology for nanopatterning
You can learn more about this event by following link:
http://www.spie.org/conferences-and-exhibitions/advanced-lithography
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