ALD 2017 - 17th International Conference on Atomic Layer Deposition

ALD 2017 - 17th International Conference on Atomic Layer Deposition - Featuring the Atomic Layer Etching Workshop -
 

DATE & LOCATION:  
July 15-18, 2017 Sheraton Denver, Denver, Colorado
 

SCOPE:
ALD 2017 will be a three-day meeting (preceded by a one day tutorial), dedicated
to the science and technology of atomic layer controlled deposition of thin films. Once again the meeting will feature the Atomic Layer Etching Workshop. As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations will available online.

WEBSITE:
Details will be posted to the ALD 2017 Website in November 2016.

www.ald-avs.org