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BEGIN:VEVENT
UID:event476@CC UPOB e.V.
DTSTAMP:20260418T000436Z
CATEGORIES:Info extern
DESCRIPTION:Plasma-Assisted Etching and Reactive Ion Etching Using High and
  Low Density Plasmas\nKategorie: Info extern\nICS-Link: https://www.upob.d
 e/index.php?option=com_jem&view=event&id=476:plasma-assisted-etching-and-r
 eactive-ion-etching-using-high-and-low-density-plasmas\n
DTSTART;VALUE=DATE:20161024
DTEND;VALUE=DATE:20161026
LOCATION:Grenoble\,Grenoble
SUMMARY:Plasma-Assisted Etching and Reactive Ion Etching Using High and Low
  Density Plasmas
URL:https://www.upob.de/index.php?option=com_jem&view=event&id=476:plasma-a
 ssisted-etching-and-reactive-ion-etching-using-high-and-low-density-plasma
 s
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