BEGIN:VCALENDAR VERSION:2.0 PRODID:-//com_jem//NONSGML kigkonsult.se iCalcreator 2.41.92// CALSCALE:GREGORIAN METHOD:PUBLISH UID:66633232-3866-4534-b861-323637336330 X-WR-TIMEZONE:UTC BEGIN:VEVENT UID:event476@CC UPOB e.V. DTSTAMP:20260901T134337Z CATEGORIES:Info extern DESCRIPTION:Plasma-Assisted Etching and Reactive Ion Etching Using High and Low Density Plasmas\n\nKategorie: Info extern\nEvent Link: https://www.up ob.de/index.php?option=com_jem&view=event&id=476:plasma-assisted-etching-a nd-reactive-ion-etching-using-high-and-low-density-plasmas DTSTART;VALUE=DATE:20161024 DTEND;VALUE=DATE:20161026 LOCATION:Grenoble\,Grenoble SUMMARY:Plasma-Assisted Etching and Reactive Ion Etching Using High and Low Density Plasmas URL:https://www.upob.de/index.php?option=com_jem&view=event&id=476:plasma-a ssisted-etching-and-reactive-ion-etching-using-high-and-low-density-plasma s X-ALT-DESC;FMTTYPE=text/html:

Plasma-Assisted Etching and Rea ctive Ion Etching Using High and Low Density Plasmas

Kategor ie: Info extern

Event Link: https://www.upob.de/index.php?option=com_jem&\;view=event&\;id= 476:plasma-assisted-etching-and-reactive-ion-etching-using-high-and-low-de nsity-plasmas

END:VEVENT END:VCALENDAR