You are encouraged to submit a paper of your recent research.

Conference Name:
23rd International Microprocesses and Nanotechnology Conference (MNC 2010)

DATE: November 9-12, 2010
PLACE: Rihga Royal Hotel Kokura, Japan

Sponsored by The Japan Society of Applied Physics

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* ABSTRACT DEADLINE : June 30, 2010 *
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Prospective authors are requested to submit following materials through MNC 2010 web site.
- Two-Page abstract in PDF together with Copyright Transfer Form. The paper submission system will be operated from June 5, 2010.

+++++ CONFERENCE SCOPE ++++++++++++++++++
1. Lithography and Related Technologies
1-1. DUV, EUV Lithography and Metrology
1-2. Electron-　and Ion-Beam Lithography
1-3. Resist Materials and Processing
2. Nanotechnology
2-0. Nanocarbon
2-1. Nanodevices
2-2. Nanofabrication
2-3. Nanomaterials
2-4. Nanotool
3. Nanoimprint, Nanoprint and Rising Lithography
4. BioMEMS, Lab. on a Chip
5. Microsystem Technology and MEMS
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Secretariat for 23rd International Microprocesses and Nanotechnology Conference (MNC 2010)
c/o Secretaryart Corporation
Mr. Hiroaki Masuko
TEL: +81-3-3420-1800　　FAX: +81-3-3420-1840
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