Diese Webseite verwendet Cookies. Wenn Sie diese Webseite nutzen, akzeptieren Sie die Verwendung von Cookies.

Mitglieder Log In

   
   
E-MailDruckenExportiere ICS

ALD 2017 - 17th International Conference on Atomic Layer Deposition

Veranstaltung

Titel:
ALD 2017 - 17th International Conference on Atomic Layer Deposition
Wann:
Sa, 15. Juli 2017 - Di, 18. Juli 2017
Wo:
Denver, Colorado
Kategorie:
Info extern

Beschreibung

ALD 2017 - 17th International Conference on Atomic Layer Deposition - Featuring the Atomic Layer Etching Workshop -
 

DATE & LOCATION:  
July 15-18, 2017 Sheraton Denver, Denver, Colorado
 

SCOPE:
ALD 2017 will be a three-day meeting (preceded by a one day tutorial), dedicated
to the science and technology of atomic layer controlled deposition of thin films. Once again the meeting will feature the Atomic Layer Etching Workshop. As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations will available online.


WEBSITE:
Details will be posted to the ALD 2017 Website in November 2016.

www.ald-avs.org


Veranstaltungsort

Standort:
Denver
Stadt:
Denver
Bundesland:
Colorado
Land:
United States

Suche

   

Kooperationen

   

Veranstaltungen

   

RSS abonnieren